발행물
컨퍼런스
ICPT 2017 (International conference on planarization/CMP technology)
2017
,
The effect of chelating agent in TMAH based post Cu-CMP cleaning solution
Improvement of wafer edge profile by controlling a pad profile
Study of post chemical mechanical polishing cleaning to remove particles through hot de-ionized water
ECT 2017
Ceramic thick film formation for insulating layer by atmospheric aerosol spray
zT measurement system supporting two separated methods