발행물
컨퍼런스
2018 International Conference on Planarization/CMP Technology (ICPT 2018)
2017
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Investigation of Abrasive Removal during Post Chemical Mechanical Polishing Cleaning_Juhwan Kim, Seokjun Hong, Vinit K. Kanade and Taesung Kim (Poster Presentation)
10th International Aerosol Conference (IAC 2018)
2007
Application of Particle aerosol technology to cmp process analysis_Taesung Kim*, Cheolmin Shin, Seokjun Hong* (Poster Presentation*)
2018 IEEE International Symposium on Medical Measurement & Applications (IEEE MEMEA)
2013
Development of Tri-axial Fiber Bragg Grating Force Sensor in Catheter Application_Hyeong- U Kim*, Dongjoo Shin, Taesung Kim* (*Oral Presentation*)
2017 International Conference on Planarization/CMP Technology (ICPT 2017)
Modified Kinematic model for predicting contact points of conditioner in CMP_Jihye Choi, Cheolmin Shin, Yinhua Jin, Taesung Kim (Oral Presentation*)
A reverse selectivity ceria slurry for silicon nitride removal during CMP_Cheolmin Shin, Seungchul Hong, Donggeon Kwak, Eungchul Kim, Taesung Kim (Oral Presentation*)