발행물

전체 논문

10

1

Etching characterization of shaped hole high density plasma for using MEMS devices
Park, WJ, Kim, YT, Kim, JH, Suh, SJ, Yoon, DH
SURFACE & COATINGS TECHNOLOGY, 200504

2

PECVD SiO2 and SiON films dependant on the rf bias power for low-loss silica waveguide
Kim, YT, Kim, DS, Yoon, DH
THIN SOLID FILMS, 200503

3

Plasma reactions of N2O on hydrogenated amorphous carbon films by PECVD
Kim, YT, Yoon, SG, Jung, SC, Suh, SJ, Yoon, DH
SURFACE & COATINGS TECHNOLOGY, 200403

4

N<sub>2</sub> doped SiO<sub>2</sub>-SiON planar waveguides deposited by PECVD method
Kim YT, Cho SM, Lee HY, Yoon HD, Yoon DH
SURFACE & COATINGS TECHNOLOGY, 200310

5

Influence of hydrogen on SiON thick film for silica waveguide deposited by PECVD and annealing effect
Kim, YT, Cho, SM, Seo, YG, Yoon, HD, Im, YM, Yoon, DH
SURFACE & COATINGS TECHNOLOGY, 200309

6

Refractive index control of core layer using PECVD and FHD for silica optical waveguide
Kim, YT, Cho, SM, Seo, Y, Yoon, HD, Im, Y, Suh, SJ, Yoon, DH
SURFACE & COATINGS TECHNOLOGY, 200307

7

Dependence of the bonding structure of DLC thin films on the deposition conditions of PECVD method
Kim, YT, Cho, SM, Choi, WS, Hong, B, Yoon, DH
SURFACE & COATINGS TECHNOLOGY, 2003

8

Annealing effect on the optical properties of a-SiC:H films deposited by PECVD
Kim YT, Cho SM, Hong BY, Suh SJ, Jang GE, Yoon DH
MATERIALS TRANSACTIONS, 200208

9

Characterization of a-SiC:H films deposited by RF plasma CVD
Kim YT, Hong B, Jang GE, Suh SJ, Yoon DH
CRYSTAL RESEARCH AND TECHNOLOGY, 2002

10

Influence of hydrogen on SiO2 thick film deposited by PECVD and FHD for silica optical waveguide
Seo, YG, Yoon, HD, Im, YM, Yoon, DH, Kim, YT, Cho, SM
CRYSTAL RESEARCH AND TECHNOLOGY, 2002