Tin-Oxo Nanoclusters This illustration depicts extreme ultraviolet (EUV)-induced structural changes in a photoresist system composed of Lewis acidic tin-oxo nanoclusters and Lewis basic polyphenols. Lewis acid-base interactions stabilize the film prior to exposure, while EUV irradiation triggers partial disassembly, promoting interactions with hydroxide ions in an aqueous developer. This chemistry enables the selective dissolution of exposed areas, leading to high-resolution positive-tone patterning. More information can be found in article number 2503002 by Jin-Kyun Lee, Jin Choi, and co-workers.