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인용수 107
·2017
In Situ Electrochemical Activation of Atomic Layer Deposition Coated MoS<sub>2</sub> Basal Planes for Efficient Hydrogen Evolution Reaction
Youngmin Kim, David H. K. Jackson, Daewon Lee, Min Choi, Tae‐Wan Kim, Soon‐Yong Jeong, Ho‐Jeong Chae, Hyun Woo Kim, Hyun Woo Kim, Noejung Park, Hyunju Chang, T. F. Kuech, Hyung Ju Kim, Hyung Ju Kim
IF 19Advanced Functional Materials
초록

Molybdenum disulfide (MoS 2 ), which is composed of active edge sites and a catalytically inert basal plane, is a promising catalyst to replace the state‐of‐the‐art Pt for electrochemically catalyzing hydrogen evolution reaction (HER). Because the basal plane consists of the majority of the MoS 2 bulk materials, activation of basal plane sites is an important challenge to further enhance HER performance. Here, an in situ electrochemical activation process of the MoS 2 basal planes by using the atomic layer deposition (ALD) technique to improve the HER performance of commercial bulk MoS 2 is first demonstrated. The ALD technique is used to form islands of titanium dioxide (TiO 2 ) on the surface of the MoS 2 basal plane. The coated TiO 2 on the MoS 2 surface (ALD(TiO 2 )‐MoS 2 ) is then leached out using an in situ electrochemical activation method, producing highly localized surface distortions on the MoS 2 basal plane. The MoS 2 catalysts with activated basal plane surfaces (ALD(Act.)‐MoS 2 ) have dramatically enhanced HER kinetics, resulting from more favorable hydrogen‐binding.

키워드
Molybdenum disulfideMaterials scienceAtomic layer depositionInertCatalysisElectrochemistryHydrogenNanotechnologyIn situTitanium
타입
article
IF / 인용수
19 / 107
게재 연도
2017