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인용수 110
·2001
Room-Temperature Imprint Lithography
Dahl‐Young Khang, Hyunsik Yoon, H. H. Lee
IF 26.8Advanced Materials
초록

Room-temperature imprint lithography showing unique features that are impossible to achieve with conventional high-temperature processes is unveiled here. Large-area nanopatterning, enabled by step-and-repeat and multiple imprinting (see Figure), leads to more versatile and practical nanoscale patterning.

키워드
Materials scienceLithographyNanotechnologyNanoscopic scaleNext-generation lithographyOptoelectronicsElectron-beam lithographyResist
타입
article
IF / 인용수
26.8 / 110
게재 연도
2001