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·2026
Above 300 GHz Ultrafast Cutoff Frequency Achieved via Air Gap‐Induced Capacitance in van der Waals ReSe <sub>2</sub> Schottky Diodes
Sungjae Hong, Gyu Lee, Hyun‐Jung Kim, Haneul Woo, B. Lee, Jaeho Im, Dahl‐Young Khang, Jong‐Gwan Yook, Seongil Im
IF 19Advanced Functional Materials
초록

ABSTRACT Sub‐terahertz ultrahigh cutoff frequencies (f C ) are achieved from a van der Waals material rhenium diselenide (ReSe 2 )‐based vertical Schottky diode, when the diode architecture is specially designed with an air gap between 100 nm‐thick ReSe 2 and Ohmic contact electrode. The maximum intrinsic f C of our diode reaches 430 GHz, the highest among the reported thin film‐based RF diodes. With the increase of air gap size, the intrinsic f C of each diode rises from ∼30 GHz (without an air gap) to 310–430 GHz. The extrinsic f C , measured from RF rectifier circuits using the air gap‐containing Schottky diode, also increases from 2 to 40 GHz. The underlying principle behind these f C enhancements is investigated using an equivalent circuit model, which closely matches the experimental results. Our air gap engineering provides a practical strategy to improve the f C of vertical Schottky diodes, opening new avenues for 2D material‐based RF electronics.

키워드
Schottky diodeCutoff frequencyOhmic contactSchottky barrierDiodevan der Waals forceCapacitanceRectifier (neural networks)
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article
IF / 인용수
19 / 0
게재 연도
2026