백인환 교수 연구실
The 40th international technical conference on circuits/systems, computers, and communications 2025
Low-temperature growth of rutile TiO2 using a SnO2 seed layer for high-k dielectric applications in DRAM devices
구분
국외
국가
대한민국
컨퍼런스명
The 40th international technical conference on circuits/systems, computers, and communications 2025
발표 제목
Low-temperature growth of rutile TiO2 using a SnO2 seed layer for high-k dielectric applications in DRAM devices
기관명
IEEE
참여 연도
2025
상세 설명
IEEE