권기청 교수 연구실
article|
인용수 0
·2025
Cryogenic atomic layer etching of SiO2 using CH2F2/Ar plasma for improved process window for nanoscale fabrication
Ji Hwan Kim, Jae Hyeon Kim, Gahong Lee, Yu Jin Heo, Gilgueng Hwang, Y. Cheon, Hyundeuk Cheon, Young Kyu Jeong, In Hyeok Kho, H. Shin, Changhee Lee, In Young Bang, Ranju Jung, Gi-Chung Kwon
Applied Surface Science
키워드
FabricationEtching (microfabrication)X-ray photoelectron spectroscopyInductively coupled plasmaAtomic layer depositionSubstrate (aquarium)Layer (electronics)Nanoscopic scaleReactive-ion etching