권기청 교수 연구실
article|
인용수 4
·2021
Etching characteristics of NF3 and F3NO at reactive ion etching plasma for silicon oxide and silicon nitride
Woo-Jae Kim, In Young Bang, Ji Hwan Kim, Yeon Soo Park, Hee Tae Kwon, Gi Won Shin, Min‐Ho Kang, Yongjun Cho, Byung-Hyang Kwon, Jung Hun Kwak, Gi-Chung Kwon
IF 0.657Journal of the Korean Physical Society
키워드
Buffered oxide etchReactive-ion etchingEtching (microfabrication)Silicon nitrideSilicon oxideSiliconMaterials sciencePlasma etchingAnalytical Chemistry (journal)LOCOS