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Universal and Nondestructive Direct Photolithography of Colloidal Quantum Dots Using Photocrosslinkable Polymer Blends (Adv. Funct. Mater. 10/2026)
Jaeyeop Lee, Seon Lee Kwak, ChaeGwang Lim, Hyeonjun Lee, W. Jung, Jaehoon Lim, Jisu Han, Kyoungeun Lee, Yeyun Bae, Jiyoon Oh, Hyoung-Jun Kim, Keon Woo Kim, Byeong Guk Jeong, Jaehoon Lim, Do‐Hoon Hwang, Jeongkyun Roh
IF 19Advanced Functional Materials
초록

Direct Photolithography In their Research Article (10.1002/adfm.202520047), Jaehoon Lim, Do-Hoon Hwang, Jeongkyun Roh, and co-workers present a universal and nondestructive direct photolithography method that enables high-resolution quantum dot (QD) patterning without ligand exchange. By blending QDs with a photocrosslinkable polymer, this approach preserves optical properties while enhancing QD-LED efficiency and operational lifetime, paving the way for next-generation display technologies.

키워드
PhotolithographyQuantum dotPolymerColloidPolymer blendPhotonics
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article
IF / 인용수
19 / 0
게재 연도
2026