Thermomechanical stability analysis of large masks (6" × 12") for high-NA EUV lithography

Pixelated source polarization optimization for high-NA EUV lithography

Sublayer dependent thermal deformation during EUV exposure

Source optimization for DRAM critical layer with minimum optical proximity correction

Relative lifetime estimation of EUV pellicle by normalized thermal stress

Underlayer dependent local wafer deformation during EUV exposure

Improving process window and resolution through source polarization in High-NA EUV

Through pitch line width difference minimization by pixel source optimization

Improving demand forecasting in open systems with cartogram-enhanced deep learning

Volcano transition in a system of generalized Kuramoto oscillators with random frustrated interactions