Comparative study of ultra-thin HfSiO and HfSiO/SiO2 gate dielectrics grown by self-limiting surface reaction between Hf(NC2H5)4 and Si(OC4H9)4 precursor
구분
국내
국가
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컨퍼런스명
화학공학회 가을 학술대회
발표 제목
Comparative study of ultra-thin HfSiO and HfSiO/SiO2 gate dielectrics grown by self-limiting surface reaction between Hf(NC2H5)4 and Si(OC4H9)4 precursor