,

Oxidation-Driven Layer-by -Layer Thinning of MoS2 to Monolayer Limit via Oxygen Plasma Treatment

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Processing for 2D Materials: Grwoth, Characterization, Modification and Device Fabrication

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Thickness Dependent Schottky Barrier of MoS2 Field-Effect Transistors

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Oxygen plasma assisted grain boundary observation of chemical vapor deposited graphene

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Large-Area CVD Growth of Two-Dimensional Semiconductor Using Sublimation of Metal Films