Structurally and Electrically Uniform Deposition of High-k TiO2 Thin Films on a Ru Electrode in Three-Dimensional Contact Holes Using Atomic Layer Deposition
Seong Keun Kim, Kyung-Min Kim, Oh Seong Kwon, Sang Woon Lee, Chung Bae Jeon, Woo Young Park, Cheol Seong Hwang, Jaehack Jeong
Electrochem. Solid St. Lett., 2005
102
Fabrication of metal-oxide-semiconductor type micro capacitive tip array using SiO2 or HfO2 gate insulators
Kyung Min Kim, Byung Joon Choi, Seong Keun Kim, Cheol Seong Hwang
Appl. Phys. Lett, 2004
103
High dielectric constant TiO2 thin films on Ru electrode grown at 250oC by atomic-layer-deposition
Seong Keun Kim, Kyung Min Kim, Wan don Kim, Cheol Seong Hwang