연구 영역
기본 정보
논문·특허
과제
구성원
Preprint|
인용수 0
·2025
High Performance All-2D Te Field Effect Transistor with Layer-engineered Homojunction using Sputtering Deposition
Byungjin Cho, Min Jeong Kim, Ojun Kwon, Se Young Oh, Eunjeong Cho, Wondeok Seo, Yeongeun Kwon, Shinhoi Kim, Min-Hee Kim, Kyungmin Lee, Minyoung Choi, Ah Ra Kim, Jongwon Yoon, Woojin Park
SSRN Electronic Journal
키워드
HomojunctionSchottky barrierTransistorField-effect transistorSputter depositionTelluriumSputteringElectrical contacts
타입
Preprint
IF / 인용수
- / 0
게재 연도
2025