,

HfO2/ZrO2 based RRAM devices

,

Impact of ultraviolet irradiation on Low-k dielectric film

,

Low-k amorphous aluminum oxide as etch stop film

,

Ferroelectricity of hafnia based ferroelectric ultrathin film with controlled oxygen vacancy distribution by interface engineering

,

Improved breakdown voltage in SrTiO3/Ga2O3 heterostructure for power diode