Characterization and De-NOx activity of binary V2O5/TiO2 and WO3/TiO2, and ternary V2O5-WO3/TiO2 SCR catalysts
Lee, BW, Cho, H, Shin, DW
JOURNAL OF CERAMIC PROCESSING RESEARCH, 2007
57
Post-CMP dry etching for the removal of the nanoscale subsurface damage layer from a single crystal La3Ga5SiO14 for a high quality wide band SAW filter device