발행물

전체 논문

12

1

Area-selective atomic layer deposition of Ru thin films using phosphonic acid self-assembled monolayers for metal/dielectric selectivity
Lee Seo-Hyun, Lee Jeong-Min, Lee Ji Hun, Kwak Junghun, Chung Sung-Woong, Kim Woo - Hee
MATERIALS LETTERS, 2022

2

Role of Cyclopentadienyl Ligands of Group 4 Precursors toward High-Temperature Atomic Layer Deposition
Van Ngoc T.T., Jang D., Jung E., Noh H., Moon J., Kil D.-S., Chung S.-W., Shong B.
Journal of Physical Chemistry C, 2022

3

Electric field control of magnetic anisotropy in the easy cone state of Ta/Pt/CoFeB/MgO structures
Park, KW (Park, Kyung-Woong), Park, JY (Park, June-Young), Baek, SHC (Baek, Seung-heon Ch, Kim, DH (Kim, Dae-Hoon), Seo, SM (Seo, Soo-Man), Chung, SW (Chung, Sung-Woong), Park, BG (Park, Byong-Guk)
APPLIED PHYSICS LETTERS, 2016

4

A multi-level capacitor-less memory cell fabricated on a nano-scale strained silicon-on-insulator
Park, JG, Kim, SJ, Shin, MH, Song, SH, Chung, SW, Enomoto, H, Shim, TH
NANOTECHNOLOGY, 2011

5

Effect of fluorine on characteristics of shallow trench isolation prepared using high-density plasma chemical vapor deposition including NF3 chemistry
Chung, SW (Chung, SW), Chung, CO (Chung, CO), Lee, SD (Lee, SD), Sohn, LC (Sohn, LC), Kwon, HY (Kwon, HY), Hong, SJ (Hong, SJ)
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS REVIEW PAPERS, 2006

6

Boron pile-up at the interface between plasma enhanced chemical vapor deposited TiSi2 film and BF2-doped Si
Lee, YJ (Lee, YJ), Sohn, HC (Sohn, HC), Chung, SW (Chung, SW)
APPLIED PHYSICS LETTERS, 2003

7

Preparation of silicon-on-insulator wafer using spin etching and a subsequent selective etching process
Lee S.-E., Oh S.-J., So S.-M., Kim H.-D., Chung S.-W., Sohn H.-C.
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2002

8

Comparative study of hydride organo siloxane polymer and hydrogen silsesquioxane
Chung, SW, Kim, SY, Shin, JH, Kim, JK, Park, J
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000

9

Dielectric properties of hydrogen silsesquioxane films degraded by heat and plasma treatment
Chung, SW (Chung, SW), Shin, JH (Shin, JH), Park, NH (Park, NH), Park, JW (Park, JW)
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, 1999

10

Electrical properties of the perovskite (Pb, La)TiO3 films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition
Chung S.W., Kim Y.I., Park H.L., Lee W.J.
Journal of Materials Science: Materials in Electronics, 1998