Inductively Coupled Plasma Reactive Ion Etcher (ICPRIE), A-Tech ICPRIE

Model : A-Tech ICPRIE, Amount : 1, Size / Gas : 6 inch wafer / CH3OH, CH4, H2O, Cl2, HBr, C2F6, O2, N2, He, Ar, Purchase date : 2005. 03., Running state : Normal

RF Magnetron Sputtering System, A-Tech sputter

Model : A-Tech sputter, Amount : 1, Size / Gas : 4 inch wafer / N2, O2, Ar, Purchase date : 2007. 07., Running state Normal

Plasma Etching System and Asher, SHA-4D-250R

Model : SHA-4D-250R, Amount : 1, Size / Gas : 6 inch wafer / C2F6, O2, Ar, Purchase date : 2003.03., Running state : Normal

Aerosol Jet Etcher

Amount : 1, Size / Gas : 4 inch wafer / Ar, Purchase date : 2001. 05., Running state : Normal

Surface profilometer, TENCOR P-1

Model : TENCOR P-1, Amount : 1, Size : 6 inch wafer, Purchase date : 2006. 11., Running state : Normal

Furnace, DS-KT-OT-120

Model : DS-KT-OT-120, Amount : 1, Size / Gas : 4 inch wafer / N2, O2, Ar, Purchase date : 2001. 01., Running state : Normal

Optical Emission Spectroscopy (OES), MAYA PRO 2000 (Ocean Optics)

Model : MAYA PRO 2000 (Ocean Optics), Amount : 1, Purchase date : 2014. 01., Running state : Normal

Spin coater, SP-3000

Model : SP-3000, Amount : 1, Size : 4 inch wafer /, Purchase date : 2001. 01., Running state : Normal

Dry Oven

Microscope