발행물

전체 논문

206

131

Characterization of Chemically Modified Wood Fibers Using FTIR Spectroscopy for Biocomposites
도금현, 이선영, 권재경, 김정현
JOURNAL OF APPLIED POLYMER SCIENCE, 201006

132

Nanoparticle contamination control for EUVL-technology-especially for photomasks in carriers and scanners
김정현, Heinz Fissan, Christof Asbach, Thomas Kuhlbusch, Jing Wang, David YH Pui, Se-Jin Yook
Proc. of SPIE, 200908

133

Erratum: ""Recent Advance in Protection Technology for Extreme Ultraviolet Lithography Masks under Low-pressure Condition"" [J. Vac. Sci. Technol. B 26, L1(2008)]
김정현
Journal of Vacuum Science and Technology B, 200807

134

Classification of highly monodisperse nanoparticles of NIST-traceable sizes by TDMA and control of deposition spot size on a surface by electrophoresis
김정현, 육세진, Heinz Fissan, Thomas Engelke, Christof Asbach, Till van der Zwaag, Jing Wang, David Y.H. Pui
JOURNAL OF AEROSOL SCIENCE, 200806

135

Controlled deposition of SiO2 nanoparticles of NIST-traceable particle sizes for mask surface inspection system characterization
김정현, Se-Jin Yook, Heinz Fissan, Thomas Engelke, Christof Asbach, Till van der Zwaag, Florence Eshbach, Jing Wang, David Y. H. Pui
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 200805

136

Recent advance in protection technology for extreme ultraviolet lithography masks under low-pressure condition
김정현
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 200801

137

Generation of phosphor particles for photoluminescence applications by spray pyrolysis
김정현, 정석원, 강윤창
JOURNAL OF MATERIALS SCIENCE, 200712

138

Experimental investigations on particle contamination of masks without protective pellicle during vibration or shipping of mask carriers
김정현, 육세진, Fissan, H, Asbach, C, Dutcher, DD, Yan, PY, Pui, DYH
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 200711

139

Experimental investigations of protection schemes for extreme ultraviolet lithography masks in carrier systems against horizontal aerosol flow
김정현, 육세진, Fissan, H, Asbach, C, van der Zwaag, T, Engelke, T, Yan, PY, Pui, DYH
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 200705

140

Numerical evaluation of protection schemes for EUVL masks in carrier systems against horizontal aerosol flow
김정현, Engelke, T, van der Zwaag, T, Asbach, C, Fissan, H, 육세진, Pui, DYH
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 200703