Growth behaviour of ZnO thin films and nanowires on SrTiO3 substrates
Dongwook Kim, Sunmi Shin, Young Do Kim, Seo Hyoung Chang, Young Jun Chang, M. Kim, Hyobin Jeong
Solid State Communications, 2007
192
Time-resolved visualization of the heat flow in VO2∕Al2O3 films
J. S. Lee, Michele Ortolani, U. Schade, Young Jun Chang, Tae Won Noh
Applied Physics Letters, 2007
193
Microspectroscopic detection of local conducting areas generated by electric-pulse-induced phase transition in VO2 films
J. S. Lee, Michele Ortolani, U. Schade, Young Jun Chang, Tae Won Noh
Applied Physics Letters, 2007
194
Surface versus bulk characterizations of electronic inhomogeneity in a<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:mi mathvariant="normal">V</mml:mi><mml:msub><mml:mi mathvariant="normal">O</mml:mi><mml:mn>2</mml:mn></mml:msub></mml:mrow></mml:math>thin film
Young Jun Chang, Jun-Won Yang, Y. S. Kim, Dong Hoe Kim, Tae Won Noh, Dongwook Kim, Eunsoon Oh, B. Kahng, J.-S. Chung
Physical Review B, 2007
195
XPS study of NiO Growth on Ag(100)
Seolun Yang, Shi-Jin Seong, J.S. Kim, Han‐Na Hwang, Cheol-Ho Hwang, Young Jun Chang, Soo-Hyon Park, Hyung‐Ki Min
Applied Science and Convergence Technology, 2007
196
Ferroelectric properties of SrRuO3∕BaTiO3∕SrRuO3 ultrathin film capacitors free from passive layers
Y. S. Kim, Ji Young Jo, D. J. Kim, Young Jun Chang, Ju Hyoung Lee, Tae Won Noh, Tae Kwon Song, J.-G. Yoon, J.-S. Chung, Sung‐Il Baik, Y.-W. Kim, C. U. Jung
Applied Physics Letters, 2006
197
Epitaxial growth and the magnetic properties of orthorhombic YTiO 3 thin films
Chae S.C., Chang Y.J., Seo S.S.A., Noh T.W., Kim D.-W., Jung C.U.
Applied Physics Letters, 2006
198
Role of oxygen vacancy in HfO2/SiO2/Si(100) interfaces
Cho D.-Y., Oh S.-J., Chang Y.J., Noh T.W., Jung R., Lee J.-C.
Applied Physics Letters, 2006
199
Polarization relaxation induced by a depolarization field in ultrathin ferroelectric BaTiO3 capacitors
Kim D.J., Jo J.Y., Kim Y.S., Chang Y.J., Lee J.S., Noh T.W., Yoon J.-G., Song T.K.
Physical Review Letters, 2005
200
Phase coexistence in the metal–insulator transition of a VO2 thin film
Young Jun Chang, Chang‐Hoon Koo, Jun-Won Yang, Yong Se Kim, Dong Hwan Kim, Jun S. Lee, Tae Won Noh, Hyun-Tak Kim, Byung Gyu Chae