Near-field sub-diffraction photolithography with an elastomeric photomask.
Paik, S.†, Kim, G.†, Chang, S., Lee, S., Jin, D., Jeong, K., Lee, I., Lee, J., Moon, H., Lee, J., Chang, K., Choi, S., Moon, J., Jung, S., Kang, S., Lee, W., Choi, H., Choi, H., Kim, H., Lee, J., Cheon, J., Kim, M., Myoung, J., Park, H., Shim, W.*
Nature Communications, 2020