Si-containing block copolymers for self-assembled nanolithography
Ross, CA, Jung, YS[Jung, Yeon Sik], Chuang, VP, Ilievski, F, Yang, JKW, Bita, I, Thomas, EL, Smith, HI[Smith, Henry I], Berggren, KK, Vancso, GJ, Cheng, JY
JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, 200811