Application of aberration-corrected TEM and image simulation to nanoelectronics and nanotechnology
Korgel, BA, Lee, DC[Lee, DohChang], Hanrath, T, Yacaman, MJ, Thesen, A, Matijevic, M, Kilaas, R, Kisielowski, C, Diebold, AC
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 200611