Initiated Chemical Vapor Deposition: A Versatile Tool for Various Device Applications
Yu, SJ[Yu, Seung Jung], Pak, K[Pak, Kwanyong], Kwak, MJ[Kwak, Moo Jin], Joo, M[Joo, Munkyu], Kim, BJ[Kim, Bong Jun], OH, MS[OH, Myung Seok], Baek, J[Baek, Jieung], Park, H[Park, Hongkeun], Choi, G[Choi, Goro], Kim, DH[Kim, Do Heung], Choi, J[Choi, Junhwan], Choi, Y[Choi, Yunho], Shin, JH[Shin, Jihye], Moon, H[Moon, Heeyeon], Lee, E[Lee, Eunjung], Im, SG[Im, Sung Gap]
ADVANCED ENGINEERING MATERIALS, 201803