RF Sputter

RF magnetron sputtering is a kind of physical vapor deposition (PVD) where Argon ions are accelerated by RF electric field to hit a target made of the material to sputter. Under the plasma environment from the energetic ions, a high-quality thin film can be deposited.

E-beam Evaporator

Thin-film deposition is an essential process in the semiconductor industry. E-beam evaporation is a type of physical vapor deposition, in which a target (metal or oxide) is bombarded by an electron beam from a W filament and deposited in a smooth or rod-type on a substrate. It has the advantage of thin-film deposition with a thickness in a range from um-scale to nm-scale.

Probe Station

Probe stations allow a user to position electrical, optical, or RF probes onto a device and to then test the response of that device to an external stimulus (electrical, optical, or RF).

Pulsed Laser Deposition

Pulsed laser deposition(PLD) is one of the physical vapor deposition (PVD) methods, which uses KrF gas as a active laser medium to deposit a target on a substrate using a high-power pulsed laser. This deposition process is performed in a ultra high vacuum state, or oxygen gas is mainly used as a background gas when deposited oxide film.

Chemical Vapor Deposition

Low-pressure chemical vapor deposition (LPCVD) is a vacuum deposition method used to produce high-quality and conformal thin-film materials. Various two-dimensional materials (MoS2, WS2, and graphene) and transition metal phosphides (MoP, CoP) can be synthesized using diverse precursors.

Mist Chemical Vapor Deposition

Mist-cvd is a kind of chemical vapor deposition where a liquid ion sources are misted by ultrasonic generator to produce a high-quality and conformal thin-film materials. Various oxide epitaxial films(including alpha gallium oxide, beta gallium oxide) could growth by using 400 - 900 celcius nitrogen a

nerator to produce a high-quality and conformal thin-film materials

Various oxide epitaxial films(including alpha gallium oxide, beta gallium oxide) could growth by using 400 - 900 celcius nitrogen atmosphere furnace

PEC Measurement System

PEC measurement system is operated through ivium potentiostats and light source. It can investigate various types of electrochemical measurements like linear sweep, transient, cyclic voltammetry, and impedance, which can aid the analysis of diverse photoelectrochemical and electrochemical reactions.

Gas Chromatography

Gas Chromatography(GC) is used for analyzing gas products. A mixture of different gases can be separated individually while passing through a GC column, and their species can be identified by retention time. Not only are they specified, but also their concentrations are determined.

Probe station (Taste Sensor)

Probe station consisting electrical, optical probes which are specialized for taste sensing purposes. Electrical signals produced from ion, molecule stimulus are measured for evaluation of the taste sensing device.