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서울대학교 본교(제1캠퍼스) 재료공학부
장호원 교수
Hydrogen Evolution Reaction
Memristor
Memristors
Gas Measurement System
Gas measurement system consists of sensing chamber, furnace, mass flow controller, and I-V source meter. Various target gases like NO2, NH3 and VOCs are inserted into the sensing chamber and the chemoresistive gas sensor shows the resistance variation. Furnace apply heat to sensing chamber and I-V sourcemeter recorded the resistance in real-time.
SPR Measurement System
Surface Plasmon Resonance (SPR) measurement system, one of the optical measureing equipment, consists of pump, LED light source, sensorchip and camera. SPR measurement system can detects changes in optical properties due to the interaction between the sensrodhip and the substacne in the various solution
Gas Sensor Array Measurement System When multiple gases are mixed, the array measurement system can measure the presence of the target gas more reliably rather than usin
Gas Sensor Array Measurement System
When multiple gases are mixed, the array measurement system can measure the presence of the target gas more reliably rather than using one individual device. It can significantly increase the selectivity of the sensors. The array measurement system consists of a sensing chamber, mass flow controller, and I-V source meter. Various target gases are inserted into the sensing chamber and the electrical resistance is recorded.
Oven
The Oven can be used for drying or tempering electronic components, hardening plastic resin, or heating plasticine at a high temperature for a long time
Centrifuge
A centrifuge uses centrifugal force to separate various components of a fluid. This is achieved by spinning the fluid at high speed within a container, thereby separating fluids of different densities or liquids from solids.
Box Furnace
Box Furnaces are utilized for heat-treating, calcining, curing, annealing, tempering, and other high temperature thermal processes
Rapid Thermal Processor
Rapid thermal processing is a semiconductor manufacturing process that heats silicon wafers to temperatures exceeding 1,000°C for not more than a few seconds. Since the temperature is raised using the radiation heat transfer, the thermal mass is small, so the heat treatment time is reduced compared to other methods.
Optical Microscopy
The optical microscope is a type of microscope that commonly uses visible light and a system of lenses to generate magnified images of small objects.
Atomic Force Microscopy
Atomic Force Microscopy (AFM), a type of scanning probe microscopy, is a measurement system using the interaction between the sample surface and the tip. AFM not only can image the sample surface in the three-dime