Hot Plate (Namil Optical Components)
용도 : Spin Coating된 Cell에 대한 Baking
Electronic Scale (Mettler Toledo, XS105 DualRange)
Maximum capacity : 120 g Maximum capacity, fine range : 41 g Readability : 0.1 mg Readability, fine range : 0.01 mg Balance dimensions (W x D x H) [mm] : 263 x 453 x 322 Usable height of draft shield : 235 mm Weighing pan dimensions (W x D) [mm] : 78 x 73 터치스크린 방식의 백라이트 디스플레이 전자동 내부 교정 기능(FACT) 용도 : 각종 재료 질량 정밀 측정
Cold Press Machine (Neo System)
Available press pressure : 10.000 kg (Maximum) Available press time : xxxx min Available post press time : xxxx pps 용도 : LC Cell 상하판 합착
Laboratory Stirrer / Hot Plate (Corning Inc., PC-420D)
Type : Stirrer / Hot Plate Power (Volts / Hz / Watts / Ampere) : 230 V/ 50 Hz / 698 W / 3.0 A Temp Range : 5°C ~ 550°C (41°F ~ 1022°F) Stir Range(RPM) : 60 ~ 1150 rpm Weight : 3.2 kg (7.0 Ibs) Top Plate Size Inches(Millimeters) : 5" x 7" (12.7 x 17.8 cm) Product Dimensions Inches(Millimeter) : 4.25 x 7.75 x 11" (10.8 x 19.7 x 28 cm) 용도 : 각종 용액 교반 및 가열
Muffle Furnace (MF-20S)
Chamber volume: 4.5L Temperature: - Working range: up to 1050℃ - Accuracy: ±2% of setting temperature - Sensor: K type - Controller: program controller Heater: 3000W Safety: Over temp. limit, NFB Dimension(WxDxH) - Internal(150x300x100mm), External(400x420x530mm) Electric requirement: 220V,60Hz
Contact Surface Profiler (Microfigure Measuring Instrument Model ET200A)
위치 : Image Room 용도 : 코팅층의 두께 측정
Exposure & Mask Alignment system (MIDAS SYSTEM)
위치 : Image Room 용도 : Mask를 사용해 UV를 조사하여 원하는 전극 Pattern 형성
Spin Coater (Midas System, Spin-3000D)
위치 : Image Room 용도 : Cell 기판 위 액상재료(배향제, 감광제 등) Spin Coating
Dispenser (Neo System, Dispenser Control System)
위치 : Image Room 용도 : LC Cell 상하판 UV 경화제 Sealing
Wet Station
위치 : Image Room 용도 : 물질 세정