Unveiling the Origin of Robust Ferroelectricity in Sub-2 nm Hafnium Zirconium Oxide Films
Lee Hyangsook, Choe Duk-Hyun, Jo Sanghyun, Kim Jung-Hwa, Lee Hyun Hwi, Shin Hyun-Joon, Park Yeehyun, Kang Seunghun, Cho Yeonchoo, Park Seontae, Moon Taehwan, Eom Deokjoon, Leem Mirine, Kim Yunseok, Heo Jinseong, Lee Eunha, Kim Hyoungsub
ACS APPLIED MATERIALS & INTERFACES, 202108