발행물

전체 논문

51

31

Preparation and characterization of ferroelectric Hf0.5Zr0.5O2 thin films grown by reactive sputtering
Lee Young Hwan, Kim Han Joon, Moon Taehwan, Do Kim Keum, Hyun Seung Dam, Park Hyeon Woo, Lee Yong Bin, Park Min Hyuk, Hwang Cheol Seong
NANOTECHNOLOGY, 201707

32

Research Update: Diode performance of the Pt/Al2O3/two-dimensional electron gas/SrTiO3 structure and its time-dependent resistance evolution
Moon Taehwan, Jung Hae Jun, Kim Yu Jin, Park Min Hyuk, Kim Han Joon, Do Kim Keum, Lee Young Hwan, Hyun Seung Dam, Park Hyeon Woo, Lee Sang Woon, Hwang Cheol Seong
APL MATERIALS, 201704

33

Giant Negative Electrocaloric Effects of Hf0.5Zr0.5O2 Thin Films
Park Min Hyuk, Kim Han Joon, Kim Yu Jin, Moon Taehwan, Do Kim Keum, Lee Young Hwan, Hyun Seung Dam, Hwang Cheol Seong
ADVANCED MATERIALS, 201609

34

Time-Dependent Negative Capacitance Effects in Al2O3/BaTiO3 Bilayers
Kim Yu Jin, Yamada Hiroyuki, Moon Taehwan, Kwon Young Jae, An Cheol Hyun, Kim Han Joon, Do Kim Keum, Lee Young Hwan, Hyun Seung Dam, Park Mm Hyuk, Hwang Cheol Seong
NANO LETTERS, 201607

35

Effect of Zr Content on the Wake-Up Effect in Hf1-xZrxO2 Films
Park Min Hyuk, Kim Han Joon, Kim Yu Jin, Lee Young Hwan, Moon Taehwan, Do Kim Keum, Hyun Seung Dam, Fengler Franz, Schroeder Uwe, Hwang Cheol Seong
ACS APPLIED MATERIALS & INTERFACES, 201606

36

Alternative interpretations for decreasing voltage with increasing charge in ferroelectric capacitors
Song Seul Ji, Kim Yu Jin, Park Min Hyuk, Lee Young Hwan, Kim Han Joon, Moon Taehwan, Do Kim Keum, Choi Jung-Hae, Chen Zhihui, Jiang Anquan, Hwang Cheol Seong
SCIENTIFIC REPORTS, 201602

37

A study on the wake-up effect of ferroelectric Hf0.5Zr0.5O2 films by pulse-switching measurement
황철성, 김한준, 박민혁, 김유진, 이영환, 문태환, 김금도, 현승담
NANOSCALE, 2016

38

Frustration of negative capacitance in Al2O3/BaTiO3 bilayer structure
김유진, 박민혁, 이영환, 김한준, 전우진, 문태환, 김금도, 정두석, YAMADA, H, 황철성
SCIENTIFIC REPORTS, 2016

39

Ferroelectricity in undoped-HfO2 thin films induced by deposition temperature control during atomic layer deposition
Kim K. D., Park M. H., Kim H. J., Kim Y. J., Moon T., Lee Y. H., Hyun S. D., Gwon T., Hwang C. S.
JOURNAL OF MATERIALS CHEMISTRY C, 2016

40

Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-Based Films
Park, Min Hyuk, Lee, Young Hwan, Kim, Han Joon, Kim, Yu Jin, Moon, Taehwan, Do Kim, Keum, Mueller, Johannes, Kersch, Alfred, Schroeder, Uwe, Mikolajick, Thomas, Hwang, Cheol Seong
ADVANCED MATERIALS, 201503