Correlation between Crystalline Defects and Electrical Characteristics of In Situ Boron-Doped Epitaxial Si0.8Ge0.2 Films
Shin, H., Eom, D., YOON, D., Kim, K., Yoo, H.K., 고대홍, Kim, H.
physica status solidi (RRL) - Rapid Research Letters, 2025
3
Characteristics of nickel silicide thin films fabricated by ultraviolet nanosecond laser annealing
Cho, Hyun, Jo, Chunghee, Nam, Kisoo, 고대홍
Applied Surface Science, 2025
4
Synthesis of high conformalty Ti-Six-N films using (CH3)3CCl and SiH4; density functional theory simulation and film characterization
JEON, J., PARK, H., 고대홍
Thin Solid Films, 2024
5
Evaluation of the chemical states and electrical activation of ultra-highly B-doped Si1-xGex by ion implantation and subsequent nanosecond laser annealing
Lee, K., Jo, C., Yoon, D., Baik, S., 고대홍
Applied Surface Science, 2024
6
Strain behavior and dopant activation of heavily in-situ B-doped SiGe epitaxial films treated by nanosecond laser annealing
Jo, C., Lee, K., Yoon, D., 고대홍
Materials Science in Semiconductor Processing, 2024
7
Properties of low-resistivity molybdenum metal thin film deposited by atomic layer deposition using MoO2Cl2 as precursor
Kim So Young, Jo Chunghee, Shin Hyerin, Yoon Dongmin, 신동혁, Cheon Min-ho, Lee Kyu-beom, Seo Dong-won, Choi Jae-wook, Park Heungsoo, 고대홍
Journal of Vacuum Science and Technology A, 2024
8
Characteristics of high-order silane based Si and SiGe epitaxial growth under 600 ℃
Yoon, D., Shin, H., Oh, S., Jo, C., Lee, K., Jung, S., 고대홍
Journal of Crystal Growth, 2024
9
Synthesis of highly conformal titanium nitride films via tert-butyl chloride-assisted atomic layer deposition
Jeon, J., Park, H., 고대홍
Applied Surface Science, 2024
10
Study on temperature-dependent growth characteristics of germanium oxide film by plasma-enhanced atomic layer deposition