Kim J. H.,  Recent Advance in Protection Technology for Extreme Ultraviolet Lithography Masks under Low-Pressure Condition.

Yook S. J., Fissan H., Engelke T., Asbach C., van der Zwaag T., Kim J. H., Wang J., and Pui D. Y. H.,  Classification of Highly Monodisperse Nanoparticles of NIST-Traceable Sizes by TDMA and Control of Deposition Spot Size on a Surface by Electrophoresis.

Jung S., Kang Y. C., and Kim J. H.,  Generation of Phosphor Particles for Photoluminescence Applications by Spray Pyrolysis.

Yook S. J., Fissan H., Asbach C., Kim J. H., Dutcher D. D., Yan P. Y., and Pui D. Y. H.,  Experimental Investigations on Particle Contamination of Masks without Protective Pellicles during Vibration or Shipping of Mask Carriers.

Yook S. J., Fissan H., Asbach C., Kim J. H., Van Der Zwaag T., Engelke T., Yan P. Y., and Pui D. Y. H.,  Experimental Investigations of Protection Schemes for Extreme Ultraviolet Lithography Masks in Carrier Systems against Horizontal Aerosol Flow.

Asbach C., Fissan H., Kim J. H., Yook S.-J., and Pui D. Y. H.,  Simple Theoretic Approach to Estimate the Effect of Gravity and Thermophoresis on the Diffusional Nanoparticle Contamination under Low Pressure Conditions.

Engelke T., van der Zwaag T., Asbach C., Fissan H., Hyeun Kim J., Yook S.-J., and Pui D. Y. H.,  Numerical Evaluation of Protection Schemes for EUVL Masks in Carrier Systems Against Horizontal Aerosol Flow.

Yook S. J., Fissan H., Asbach C., Hyeun Kim J., Wang J., Yan P. Y., and Pui D. Y. H.,  Evaluation of Protection Schemes for Extreme Ultraviolet Lithography (EUVL) Masks against Top-down Aerosol Flow.

Asbach C., Fissan H., Kim J. H., Yook S. J., and Pui D. Y. H.,  Technical Note: Concepts for Protection of EUVL Masks from Particle Contamination.

Kim J. H., Fissan H., Asbach C., Yook S.-J., Wang J., and Pui D. Y. H.,  Effect of Reverse Flow by Differential Pressure on the Protection of Critical Surfaces against Particle Contamination.