ICAMD 2025

Oxygen vacancy control via sputtering and plasma treatment for high-performance of (Hf,Zr)O2-based antiferroelectric capacitors

2025

ICAMD 2025

Interfacial engineering of TiN electrodes by Ar plasma for improved ferroelectricity in Hf0.5Zr0.5O2 thin films

2025

ICAMD 2025

Substrate- and thickness-dependent stress effects in (Hf,Zr)O2 ferroelectric thin films

2025

ICAMD 2025

Thermally stable thin-film transistor with In-Ga-O channel deposited by atomic layer deposition

2025

ICAMD 2025

Emergence of ferroelectricity in annealing-free Hf0.5Zr0.5O2 with MoO3 interlayer driving oxygen ion migration

2025