Effects of the axial external magnetic field on the reduction of the dielectric window damage due to capacitive coupling in the inductively coupled plasma
10057301
Journal of Vacuum Science & Technology A, 15(3) 564, May/Jun. (1997), 199704
42
식각 용기 가열에 의한 라디칼 손실 제어가 고선택비 산화막 식각에 미치는 영향
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한국진공학회지, 199607
43
Study of Radiation Damage and Contamination by Magnetized Inductively Coupled Plasma Etching
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Journal of Vacuum Science & Technology A, 199604
44
Effects of Magnetic Field on Oxide Etching Characteristics in Planar Type Radio Frequency Inductively Coupled Plasma
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Journal of Vacuum Science & Technology A, 199604
45
The Effects of Magnetic Field on Planar Type RF Inductively Coupled Argon Plasma
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Plasma Sources Science & Technology, 199604
46
ECR 플라즈마 식각 장치에서 플라즈마 물성이 식각 특성에 미치는 영향
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대한전기학회논문지, 199307
47
이온 분석기에 의한 ECR 플라즈마의 특성 및 실리콘 식각에 관한 연구
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대한전기학회논문지, 199207
48
Cryogenic Electron Cyclotron Resonance Plasma Etching
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Journal of Vacuum Science & Technology A, 199204
49
Wafer heating uniformity: enhancement using toroidal slot antennas and resonant cavity modes
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JOURNAL OF PHYSICS D-APPLIED PHYSICS, 202501
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4H-SiC/SiO2 Interface Degradation in 1.2 kV 4H-SiC MOSFETs Due to Power Cycling Tests