발행물
컨퍼런스
ALD 2010(10th International Conference on Atomic Layer Deposition)
2010
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Deposition Characteristic and Structure analysis of TaCxNy film with new Ta precursor (Chan TAL) deposited by PEACD
APS March Meeting 2010
Effect of crystallinity in resistance swiching behavior of epitaxial NiO films
Characteristic Picture of Fe-Based Disordered Alloy :｛＼em Ab Initio｝Study
제 38회 한국진공학회 동계정기학술대회
Toward high-performance iron based alloys : Ab initio study
제 19회 유전체물성 심포지엄 & 제11회 강유전체 소자/소재 워크숍
Atomic structure of conducting nano-filaments in resistive switching memory