주요 논문
5
*2026년 기준 최근 6년 이내 논문에 한해 Impact Factor가 표기됩니다.
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article
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인용수 2
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2025Plasma-driven defect modulation in ZnO thin films for superior UV sensing
Dong-Geon Lee, Jin Seo Im, Mi‐Jin Jin, Doo‐Seung Um, Chang-Il Kim
IF 4.2 (2025)
Optical Materials
https://doi.org/10.1016/j.optmat.2025.117432
Thin film
Modulation (music)
Optoelectronics
Plasma
Materials science
Optics
Nanotechnology
Physics
Acoustics
2
article
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인용수 3
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2024Transition of Cu film to Cu2O film through oxygen plasma treatment
Qiang Liu, Ji-Yeop Kim, Mi‐Jin Jin, Doo‐Seung Um, Chang-Il Kim
IF 4.7 (2024)
Materials Chemistry and Physics
https://doi.org/10.1016/j.matchemphys.2024.129090
Plasma
Oxygen
Materials science
Thin film
Chemical engineering
Engineering physics
Chemistry
Nanotechnology
Physics
Engineering
3
article
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인용수 20
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2023Reducing the oxygen vacancy concentration in SrTiO3-δ thin films via an optimized O2 plasma treatment for enhancing device properties
Ji-Yeop Kim, Mi‐Jin Jin, Bo Hou, Minsoo P. Kim, Doo‐Seung Um, Chang-Il Kim
IF 6.3 (2023)
Applied Surface Science
https://doi.org/10.1016/j.apsusc.2023.158271
Materials science
Strontium titanate
Thin film
Fabrication
Sputtering
Oxygen
Perovskite (structure)
Oxygen sensor
Conductivity
Nanotechnology
4
article
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인용수 2
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2023Nanohole texturing to improve the performance of a microscopic photodetector
Donggeon Lee, Kyeong-Keun Choi, Deok‐kee Kim, Doo‐Seung Um, Chang-Il Kim
IF 4.2 (2023)
Materials Science in Semiconductor Processing
https://doi.org/10.1016/j.mssp.2023.107915
Materials science
Photodetector
Miniaturization
Silicon
Optoelectronics
Substrate (aquarium)
Etching (microfabrication)
Fabrication
Plasma etching
Nanotechnology
5
article
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인용수 2
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2022The Reflectance Characteristics of an Inverse Moth-Eye Structure in a Silicon Substrate Depending on SF6/O2 Plasma Etching Conditions
Jong‐Chang Woo, Doo‐Seung Um
IF 3.4 (2022)
Micromachines
빛 반사를 감소시키기 위한 가스를 사용하였다. 높은 식각 속도는 높은 표면 거칠기를 유발하며, 이는 낮은 표면 반사 특성을 초래한다. 역(逆) 모스아이 구조는 대각선으로 배열된 정사각형 PR 패턴을 사용하여 구현하였고, 첨두 간격 1 μm에서 가시광 영역에서 최소 반사를 나타냈다. 본 연구는 더 높은 효율의 광학 소자 개발에 적용될 수 있다.
https://doi.org/10.3390/mi13101556
Materials science
Etching (microfabrication)
Optics
Silicon
Optoelectronics
Substrate (aquarium)
Reflectivity
Plasma etching
Reactive-ion etching
Isotropy