발행물
컨퍼런스
제 11회 한국진공학회/플라즈마분과 기술 워크숍[plasma damage monitoring and control]
,
플라즈마를 이용한 원자스케일 공정 전산모사
MCARE 2019
Topography simulation of nanoscale device fabrication process
Study on effective functionalization of nanowire FET Sensor for harmful gas
Diagnosis of additive gas into fluorocarbon-based etchant gases on the plasma etching process
Experiment and theoretical study on the effect of various surface morphology for highly sensitive ion-sensitive semiconductor nanowire sensors