발행물
컨퍼런스
한국화학공학회 2013 가을 학회 및 학술대회
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Large scale feature profile simulation for plasma etch process of high aspect ratio contact hole
3D feature profile simulation of mask effects of mask effects in high aspect contact hole etch process
66th GASEOUS ELECTRONICS CONFERENCE
Silicon oxide surface reaction modeling coupled with global bulk plasma model in niductive coupled fluorocarbon plasmas
GPU based 3D feature profile simualation of high aspect ratio contact hole etch process under fluorocarbon plasmas
SEMES PLASMA conference 2013
Ultra-fast 3D etch profile simulation coupled with realistic plasma database