발행물
컨퍼런스
한국 화학공학회 2016년도 봄 총회 및 학술대회
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3D Charge-up simulation coupled with realistic plasma surface reaction model in plasma etch process
한국화학공학회 2015년도 가을 총회 및 학술대회
Nano-imprinted nanowire device coupled with plasma process for chemical and biological sensors
Study on solution-gating effects of nanowire field effect transistors fabricated by top-down method
Charge-up simulation coupled with unified semi-global surface model for UHARC plasma etching in semiconductor fabrication
AVS 62ND INTERNATIONAL SYMPOSIUM & EXHIBITION
Realistic Plasma Etch Simulation for High Aspect Ratio Contact Hole using Graphics Processing Units