,

Fabrication of Atomic-layer-deposited Ru/Mo2N Bilayer as Bottom Electrode for Next-generation DRAM Capacitor

,

Achieving Low Resistivity of Sub-5 nm Atomic Layer Deposition Ru Films

,

Thermal atomic layer deposition of Ru-incorporated MoCx films as Cu diffusion barrier and seed layer

,

Plasma-enhanced Atomic Layer Deposition of TiN/Mo2N Stacks for Advanced Storage Nodes in Next-generation DRAM Capacitors

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Atomic Layer Deposition of Distorted Rutile Structure MoO2 for High-Performance TiO2-Based DRAM Capacitors