,

SrTiO3 Thin Film Growth by Atomic Layer Deposition Using Ti(O-iPr)2(thd)2, Sr(thd)2, and H2O

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Dielectric and electrode thin films for stack-cell structured DRAM capacitors with sub 50-mn design rules

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SrTiO3 Thin Film Growth by Atomic Layer Deposition

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Understanding the atomic-layer-deposition mechanism for multi-component high dielectric SrTiO3 and ferroelectric PbTiO3 thin films