,

TiO2 AND Al doped TiO2 films grown by atomic layer deposition for next generation DRAM capacitor

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Pulse CVD of RuO2 thin films using a noble Ru precursor for memory application

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Improved growth characteristics of SrTiO3 thin films deposited by Atomic Layer Deposition using Sr(iPr3Cp)2 and Ti(O-iPr)2(thd)2

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Pulsed chemical vapor deposition of Ruthenium dioxide thin films Using RuO4 precursor for the DRAM capacitor electrode

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Improved Growth Characteristics of Strontium Titanate Thin Film Grown By Atomic Layer Deposition using Sr(iPr3Cp)2