발행물
컨퍼런스
Atomic Layer Deposition 2010
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SrTiO3 Thin Films with Highly Enhanced Atomic Layer Deposition Rate for Ultrahigh Density Capacitors
Development of an ALD-like SrRuxOy Low Temperature Process
Investigation on the Growth Initiation of Ru Thin Films by Atomic Layer Deposition
Characterization of ALD Al-doped TiO2 films on ultrathin Ru buffered TiN layer for application to sub-30 nm DRAM capacitor
Pulsed chemical vapor deposition of RuO2 films and electrical performance of ALD TiO2 film on the RuO2 electrode