Low-resistivity and high-density molybdenum carbonitride films grown by plasma-enhanced atomic layer deposition

Enhanced Oxidation Resistance and Interface Stability of Atomic-Layer-Deposited MoNx Electrodes via TiN Passivation for DRAM Cell Capacitor Applications

Aluminum-Doped Indium Oxide Electron Transport Layer Grown by Atomic Layer Deposition: Highly Efficient and Damage-Resistant Interconnection Solution for All-Perovskite Tandem Solar Cells with 25.46% Efficiency

Plasma-enhanced atomic layer deposition of indium-free ZnSnOx thin films for thin-film transistors

Low temperature crystallization of atomic-layer-deposited SrTiO3 films with an extremely low equivalent oxide thickness of sub-0.4 nm

Growth of Atomic layer-deposited Monoclinic Molybdenum Dioxide Films Stabilized by Tin Oxide Doping for DRAM Capacitor Electrode Applications

Growth of conformal TiN thin film with low resistivity and impurity via hollow cathode plasma atomic layer deposition

High-performance of ZnO/TiO2 heterostructured thin-film photocatalyst fabricated via atomic layer deposition

Plasma-enhanced atomic layer deposition of molybdenum carbide and carbonitride films using bis (isopropylcyclopentadienyl) molybdenum (IV) dihydride and an H2/N2/Ar plasma

Ternary Ga?Sn?O and quaternary In?Ga?Sn?O channel based thin film transistors fabricated by plasma-enhanced atomic layer deposition