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전체 논문

172

51

Horizontally aligned ALD-SnO films grown on SiO2-passivated high-k HfO2 dielectrics for high-mobility and low-power P-channel thin-film transistor
한정환, 김진아, 장희원, 채명길, 최희낭, 신정은, 박보근, 정택모
Surfaces and Interfaces, 202312

52

Phase-controlled molybdenum dioxide electrodes by RF reactive magnetron sputtering for achieving high-k rutile TiO2 dielectric
한정환, 이재현, 강완구, 정홍근, 김성근
Vacuum, 202311

53

High Field-Effect Mobility and On/Off Current Ratio of p-Type ALD SnO Thin-Film Transistor
한정환, 채명길, 김진아, 장희원, 박보근, 정택모, 김성근
ACS APPLIED ELECTRONIC MATERIALS, 202304

54

Electromigration Reliability of Barrierless Ruthenium and Molybdenum for Sub-10 nm Interconnection
한정환, 김정균, 이학승, 손명원, 박주성, 김광민, 전재범, 송한찬, 김근우, 박병국, 김경민
ACS Applied Electronic Materials, 202304

55

Atomic layer deposition of ZnO layers on Bi2Te3 powders: Comparison of gas fluidization and rotary reactors
한정환, 정명준, 지명준, 이영인, 오승탁, 이민환, 0
CERAMICS INTERNATIONAL, 202212

56

Low-resistivity ruthenium metal thin films grown via atomic layer deposition using dicarbonyl-bis(5-methyl-2,4-hexanediketonato)ruthenium (II) and oxygen
한정환, 고은총, 김재연, 이학승, 김경민
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 202212

57

Thermal atomic layer deposition of molybdenum carbide films using bis(ethylbenzene)molybdenum and H-2
한정환, 안지상, 강완구
Journal of Vacuum Science & Technology A, 202212

58

표면 반응 제어를 통한 영역 선택적 원자층 증착법 연구 동향
한정환, 고은총, 안지상
한국표면공학회지, 202212

59

High-performance Atomic-Layer-Deposited SnO thin film transistors fabricated by intense pulsed light annealing
한정환, 김진아, 채명길, 한영준, 최준, 최희낭, 박보근, 정택모, 이웅규
Applied Surface Science, 202210

60

Polycrystalline and high purity SnO2 films by plasma-enhanced atomic layer deposition using H2O plasma at very low temperatures of 60-90 degrees C
한정환, 원종현, 최희낭, 한성호, 박보근, 정택모
VACUUM, 202202