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1
Pressure distribution and Wear of Grinding Wheel in Ultra-Thinning Process of LiTaO3 Wafer
Haeseong Hwang, Seungho Han, Hyunseop Lee
International Journal of Precision Engineering and Manufacturing, 2024
2
An Analysis of Edge Chipping in LiTaO3 Wafer Grinding Using a Scratch Test and FEA Simulation
Haeseong Hwang, Seungho Han, Hyunseop Lee
Lubricants, 2023
3
Tribological Study on Photocatalysis-Assisted Chemical Mechanical Polishing of SiC
Hyunseop Lee
Lubricants, 2023
4
Material Removal Characteristics of Abrasive-Free Cu Chemical-Mechanical Polishing (CMP) Using Electrolytic Ionization via Ni Electrodes
Hyunseop Lee
Micromachines, 2023
5
Approaches to Sustainability in Chemical Mechanical Polishing (CMP): A Review
Hyunseop Lee, Hyoungjae Kim, Haedo Jeong
International Journal of Precision Engineering and Manufacturing-Green Technology, 2022
6
Electrolytically Ionized Abrasive-Free CMP (EAF-CMP) for Copper
Seonghyun Park, Hyunseop Lee
Applied Sciences, 2021
7
Contact-Area-Changeable CMP Conditioning for Enhancing Pad Lifetime
Jungyu Son, Hyunseop Lee
Applied Sciences, 2021
8
Hybrid CMP Slurry Supply System Using Ionization and Atomization
Hoseong Jo, Da Sol Lee, Seon Ho Jeong, Hyun Seop Lee, Hae Do Jeong
Applied Sciences, 2021
9
Preliminary Study on Polishing SLA 3D-Printed ABS-Like Resins for Surface Roughness and Glossiness Reduction
Jungyu Son, Hyunseop Lee
Micromachines, 2020
10
Preliminary Study on Fluidized Bed Chemical Mechanical Polishing (FB-CMP) Process for Stainless Steel 304 (SS304)
Taekyoung Kim, Hyunseop Lee
Micromachines, 2020
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