Photoresist Adhesion Effect of Resist Reflow Process

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A study of virtual lithography process for polymer directed self-assembly

<title>Influences of various defects on extreme ultra-violet mask</title>

22 nm node contact hole formation in extreme ultra-violet lithography

<title>Acid diffusion length dependency for 32-nm node attenuated and chromeless phase shift mask</title>

Angular dependency of off-axis illumination on 100-nm-width pattern printability for extreme ultraviolet lithography: Ru/Mo/Si reflector system

Tourmaline the Indicator Mineral: From Atomic Arrangement to Viking Navigation INTRODUCTION

Random field Ising model and community structure in complex networks

Dynamics and Directionality in Complex Networks