Effects of Work Function and Thermal Stability of Top Electrode Materials on Electrical Properties of ZrO2-Based DRAM Capacitors
이웅규
ELECTRONIC MATERIALS LETTERS, 2025
2
DRAM 커패시터 용 TiN 박막 전극의 스퍼터링 공정 최적화
이웅규
세라미스트, 2025
3
Atomic layer deposition of Ru/rutile Al-TiO2/Ru layer stacks for high-performance silicon capacitors
이웅규
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2025
4
Improvement of interfacial electrical properties of Au/ZrO2/Al2O3/TiN capacitors by reduction effect of Ar plasma treatment
이웅규
Ceramics International, 2025
5
Atomic layer etching of ZrO2 thin films for DRAM capacitors using NF3 plasma and TiCl4
이웅규
Ceramics International, 2025
6
Emergence of material-driven two-dimensional electron gas by thermodynamically robust layers in Al2O3/In2O3/Al2O3 nanolaminate structures
이웅규
NANOSCALE, 2025
7
Enhancement of electrical properties of morphotropic phase boundary in Hf1-xZrxO2 films by integrating Mo electrode and TiN interlayer for DRAM capacitors
이웅규
Applied Surface Science Advances, 2025
8
Improved resistive switching characteristics of Au/TiO2/Au memristors on PDMS substrates with pyramid arrays
이웅규
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2025
9
Emergence of Material-Driven Two-Dimensional Electron Gas by Thermodynamically Robust Layers in Al2O3/In2O3/Al2O3 Nanolaminate Structures
유경훈
Nanoscale, 2025
Back Cover
10
Atomic layer deposition of Ru/rutile Al-TiO2/Ru layer stacks for high-performance silicon capacitors