Charge retention effect in metal-oxide-semiconductor structure containing Si nanocrystals prepared by ion-beam-assisted electron beam deposition
Yong Kim, Kyung Hwa Park, Won Chel Choi, Tae Hun Chung, Hong Jun Bark, Jae-Yel Yi, Jaein Jeong
Mater. Sci. Eng. B, 2001
62
Ultralarge capacitance-voltage hysteresis and charge retention characteristics in metal oxide semiconductor structure containing nanocrystals deposited by ion-beam-assisted electron beam deposition
Yong Kim, Kyung Hwa Park, Tae Hun Chung, Hong Jun Bark, Jae-Yel Yi, Won Chel Choi, Eun Kyu Kim, Ju Wook Lee, Jeong Yong Lee
Appl. Phys. Lett., 2001
63
Growth Mechanism of Truncated Triangular III-V Nanowires
J. Zou, M. Paladugu, Y.N. Guo, Yong Kim, Q. Gao, H.J. Joyce, H. H. Tan, C. Jagadish
Small, 2007
64
Influence of nanowire density on the shape and optical properties of ternary InGaAs nanowires
Yong Kim, H. J. Joyce, Q. Gao, H. H. Tan, C. Jagadish, M. Paladugu, J. Zou, A. A. Suvorova
Nano Lett., 2006
65
The influence of secondary ion beam irradiation on the formation of Si nanocrystals during dual ion beam sputtering
Jae Kwon Kim, Kyu Man Cha, Jung Hyun Kang, Yong Kim, Jae-Yel Yi, Tae Hun Chung, Hong Jun Bark
Thin Solid Films, 2005
66
Growth of highly luminescent silicon nanocrystals by rapid thermal chemical vapour deposition
Hea Jung Cheong, Jung Hyun Kang, Jae Kwon Kim, Yong Kim
Key Eng. Mater., 2005
67
Formation of luminescent Si nanocrystals by high-temperature rapid thermal chemical vapor deposition
Hea Jeong Cheong, Jung Hyun Kang, Jae Kwon Kim, Yong Kim, Jae-Yel Yi, Tae Hun Chung, Hong Jun Bark
Appl. Phys. Lett., 2003
68
Rapid-thermal-annealing effect on lateral charge loss in metal-oxide-semiconductor capacitors with Ge nanocrystals
Jae Kwon Kim, Hea Jeong Cheong, Yong Kim, Jae-Yel Yi, Hong Jun Bark, S. H. Bang, J. H. Cho
Appl. Phys. Lett., 2003
69
Temperature dependence of photoluminescence from single core-shell GaAs-AlGaAs nanowires
L. V. Titova, T. B. Hoang, H. E. Jackson, L. M. Smith, J. M. Yarrison-Rice, Yong Kim, H. J. Joyce, H. H. Tan, C. Jagadish
Appl. Phys. Lett., 2006
70
Plasma enhanced chemical vapour deposition of nitrogen-incorporated silicon oxide films using TMOS/N2O gas